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Main image for McCarter & English Hosts Screens, Conflict and the Ethical Patent Practice CLE Program
Events|Sponsor

McCarter & English Hosts Screens, Conflict and the Ethical Patent Practice CLE Program

New Jersey Intellectual Property Law Association's (NJIPLA)

5.11.2016

McCarter & English, LLP
100 Mulberry St., Four Gateway Center
Newark, NJ 07102

McCarter & English hosts the New Jersey Intellectual Property Law Association’s (NJIPLA) Screens, Conflict and the Ethical Patent Practice CLE program on May 11, 8:30 AM – 11:00 AM.

The ethics of patent practice are back before the bench, and not just for patent prosecutors. From litigation screens to subject matter conflicts, new ethical issues have emerged that may affect IP practice in New Jersey. NJIPLA invites you to a live CLE and breakfast networking event to learn what you need to know.

Chair: Mark Anania

Speakers:
• Mark E. Nikolsky, Partner, McCarter & English, LLP. Mr. Nikolsky’s practice focuses on patent prosecution and AIA post-grant proceedings.
• William T. Reilly, Partner, McCarter & English, LLP. Mr. Reilly serves as the law firm’s General Counsel and advises the firm on ethics issues.
• Lisa H. Wang, Patent Attorney, U.S. Army. Ms. Wang is a patent attorney with the United States Army where she prepares and prosecutes patent applications and counsels on intellectual property matters relating to government matters.

CLE Ethics Credits: 1.25-1.5 hrs. (pending approval)

Fees: $35 for NJIPLA Members; $50 for non-members; $20 for students.

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Media item: Mark H. Anania
Mark H. Anania

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William T. Reilly

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Mark E. Nikolsky

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